HJT板式等离子体增强化学气相沉积设备

设备名称 Equipment Name

HJT板式等离子体增强化学气相沉积设备  HJT In-line PECVD

设备型号 Equipment Model

PD-1022/UD

设备用途 Equipment Application

制备本征及掺杂非晶硅薄膜。

Intrinsic film deposition & a-si film doping.

设备工艺  Processes

工艺气体在射频RF电磁场环境中电离相互反应，在衬底上沉积出相应的薄膜材料。

Ionized precursor gases deposit thin films on a substrate.

技术特点  Features

1、较小反射功率的快速启辉、均匀稳定大面积成膜。

Quick RF ignition with least reflect power for uniform and stable film deposition.

2、成熟稳定的多点馈入射频RF技术、技术兼容性和产品升级。

Matured and stable multi-feed in RF technology compatible for even large process chamber.

3、腔体内反应间距可调、灵活的工艺窗口。

Continuous adjustable gas between diffuser and substrate providing flexible process possibilities.

4、大产能低成本、定制设备结构。

High throughput with relative low cost, with capability of customized product design.

5、模块化设计便于安装和维护、高标准的安全设计思想。

Modularized design for easy installation and maintenance, together with highest safety protocol from design to fabrication.

设备参数  Parameters