光注入退火炉

设备名称 Equipment Name

光注入退火炉  Light Injection Annealing Furnace

设备型号 Equipment Model

SC-LED05L/RA

设备用途 Equipment Application

调节电池片费米能级变化，控制H总量及价态，提高H钝化与缺陷修复效率，达到降低P型电池衰减效应，提高N型电池转换效率的效果。

By adjusting the Fermi energy level of the cell, controlling the total amount and valence state of H,improving the efficiency of H passivation and defect repair, to reduce the LID effect of P-type cells and improve the conversion efficiency of N-type cells.

工艺流程  Process Flow

预热→光注入→冷却

Pre-heating →Light Injection →Cooling

技术特点  Features

1、双轨产线，机架电气完全独立，互不干扰。

Dual-track production line, the rack and electrical parts completely independent without interfering operations of each other.

2、大产能：匹配丝印工序产能，CT≤0.80秒，基于硅片尺寸M10（18X±0.5mm*18X±0.5mm）。
High throughput: match with the throughput of screen printing process, CT≤0.80s,based on silicon wafer size M10 (18X±0.5mm*18X±0.5mm). 

设备参数  Parameters