设备名称 Equipment Name

链式酸抛光清洗设备  Inline Acid Polishing Equipment

设备型号 Equipment Model

SC-LSP4500/ SC-LSP8000

设备用途 Equipment Application

对单、多晶硅片进行刻蚀/抛光、清洗、干燥。
Etching/polishing, cleaning and drying of mono/multi crystalline solar cells.

工艺流程 Process Flow

正面保护→刻蚀/抛光→碱洗→酸洗→烘干
Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying.

技术特点  Features

1. 高产能：4500PCS/5道，8000PCS/10道。
High Throughput: 4000pcs/h, 5 lanes; 8000pcs/h, 10 lanes.

2. 高均匀性，超长药液寿命。
Excellent Uniformity, long bath life time.

3. 支持多种添加剂或混合添加剂技术。
Various additives or mixed additives technology.

4. 支持最薄120μm硅片。
Wafer thickness down to 120μm.

5. 快速换液，在线换液。
Quick inline bath change.

6. ⽀持背面抛光工艺，超低药耗。
Suitable for rear side polishing and with low chemical consumption.

7. ⽀持MES，选配在线称重检测。
Suitable with MES ; Inline weight testing is optional.

8. 兼容酸抛光功能。
Compatible with acid polish function.

设备参数  Parameters