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链式酸抛光清洗设备


设备简介  Equipment Description

设备名称:链式酸抛光清洗设备
Equipment Name: Inline Acid Polishing Equipment

设备型号:SC-LSP4500/ SC-LSP8000
Equipment Model: SC-LSP4500/ SC-LSP8000

设备用途:对单、多晶硅片进行刻蚀/抛光、清洗、干燥。
Equipment Application: Etching/polishing, cleaning and drying of mono/multi crystalline solar cells.

工艺流程:正面保护→刻蚀/抛光→碱洗→酸洗→烘干
Process Flow: Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying.

 

技术特点  Features

· 高产能:4500PCS/5道,8000PCS/10道。
  High Throughput: 4000pcs/h, 5 lanes; 8000pcs/h, 10 lanes.

· 高均匀性,超长药液寿命。
  Excellent Uniformity, long bath life time.

· 支持多种添加剂或混合添加剂技术。
  Various additives or mixed additives technology.

· 支持最薄120μm硅片。
  Wafer thickness down to 120μm.

· 快速换液,在线换液。
  Quick inline bath change.

· ⽀持背面抛光工艺,超低药耗。
  Suitable for rear side polishing and with low chemical consumption.

· ⽀持MES,选配在线称重检测。
  Suitable with MES ; Inline weight testing is optional.

· 兼容酸抛光功能。
  Compatible with acid polish function.


设备参数  Parameters