Batch-type Alkaline Polishing Equipment

Equipment Name

Batch-type Alkaline Polishing Equipment

Equipment Model

SC-CSZJ9600E-15F

Equipment Application

This equipment is used for polishing, etching and cleaning treatment of diffused wafers and also compatible for texturing and cleaning treatment of bifacial solar cells.

Process Flow

Pre-cleaning→Polishing→Post-cleaning/ O₃ cleaning→Acid cleaning→Hot water drying→Drying (for reference only)

Features 

1. Throughput: 400pcs/batch,9600pcs/h(210 wafer),480pcs/batch,12000pcs/h(182 wafer).

2. Compatible with rear side etch polishing and mono-crystalline rear side texturing process.

3. Suitable for various additives.

4. Wafer thickness handling capability up to 120μm.

5. With dry clean area and self-cleaning system.

6. Quick inline bath change.

7. Suitable with MES, RFID system, inline weight testing optional.

Parameters