Horizontal LPCVD

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Horizontal LPCVD

Equipment Name

Horizontal LPCVD

Equipment Model


Equipment Application

Deposition of tunnel oxide layer, i-Poly and D-poly for TOPCon solar cells.



1、Low pressure and hot wall process characteristics, with better film uniformity and good compactness.

2、LPCVD process, densely loaded substrates have little effect on the coating rate, with large loading capacity in single tube.

3、More temperature zones to ensure the uniformity between wafers reliably.

4、Independently adjustable segmented air inlet to compensate for the airflow depletion effect.