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槽式碱抛光清洗设备


设备名称 Equipment Name
槽式碱抛光清洗设备  Batch Alkaline Polishing Equipment

设备型号 Equipment Model
SC-CSZ8000E-14F

设备用途 Equipment Application
用于扩散后的硅片抛光刻蚀、清洗处理,以及搭配双面电池背面制绒、清洗处理。
This equipment is used for polishing, etching and cleaning treatment of diffused wafers and also compatible for texturing and cleaning treatment of bifacial solar cells.

技术特点  Features 

· 产能:400pcs/批,8000pcs/小时。
  Throughput: 400pcs/batch, 8000pcs/h.

· 兼容背面刻蚀抛光及单晶背面制绒工艺。
  Compatible with rear side etch polishing and mono-crystalline rear side texturing process.

· 支持多种添加剂技术。
  Suitable for various additives.

· 支持最薄120um硅片。
  Wafer thickness down to 120um.

· 洁净区域干燥,自洁净系统。
  With dry clean area and self-cleaning system.

· 低温烘干技术。
  Low-temperature drying.

· 快速换液,在线换液。
  Quick inline bath change.

· 支持MES、RFID及选配在线称重功能。
  Suitable with MES, RFID system, inline weight testing optional.


设备参数 Parameters