PRODUCTS > Crystalline Silicon Battery Equipment > Automatic Mono-Crystalline Texturing Equipment

Automatic Mono-Crystalline Texturing Equipment

Low CoO

Inline Bath Change

Inline Drying

O3 Fuction

·H2O2 free

 

Equipment Description     

Equipment Name: Automatic Mono-Crystalline Texturing Equipment

Equipment Model: SC-CSZ7400E-15F

Equipment Application: Used for texturing & cleaning of mono crystalline wafers.

Processing Steps:  Saw damage removal→Pre-cleaning→Mono-texturing→Post cleaning→Acid cleaning→Hot water drying→Drying (for reference only)

 

Features

·Throughput: 400PCS/batch, 7400PCS/H.

·Process Bath circulation volume adjustable.

·Uniform pyramids texture, etch depth adjustable. 

·Wafer thickness down to 120μm.

·With clean dry area and self-clean dry system.

·H2O2 free.

·Quick inline bath change.

·Suitable with MES, RFID and inline weight testing optional.

 

Parameters

全自动单晶制绒酸洗综合设备--参数.JPG