·Inline Acid Polishing Equipment
·Etching/polishing,cleaning and drying of mono/multi crystalline solar cells.
·Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying.
· High Throughput: 4000pcs/h, 5 lanes; 8000pcs/h, 10 lanes.
· Excellent Uniformity, long bath life time.
· Various additives or mixed additives technology.
· Wafer thickness down to 120μm.
· Quick inline bath change.
· Suitable for rear side polishing and with low chemical consumption.
· Suitable with MES ; Inline weight testing is optional.
· Compatible with acid polish function.