Horizontal LPCVD

Equipment Name

Horizontal LPCVD

Equipment Model


Equipment Application

Mainly used for deposition of Poly-Si layer and in-situ doping in the production of c-si solar cells.

Processing Steps

Saw damage removal→Pre-cleaning→Mono-texturing→Post cleaning→Acid cleaning→Hot water drying→Drying (for reference only)


·Low pressure chemical vapor deposition.

·Multiple water-cooled tube sealing technology.

·Double-layer quartz tube structure.

·Independently regulated sectional air inlet.

·Translational furnace door driver mechanism.

·High-speed integral module boat pushing mechanism.

·Digital control.

·More temperature zone control.

·Intelligent automatic control.

·Alarm protection for over-heating, thermocouple-break and boat collision.